🚀 Revolutionizing Defect Detection with Deep Block

Important Announcement

Due to the ongoing license violation and malicious attacks by Korean(domestic) aerospace scam startups, we have decided to temporarily provide free trial of app.deepblock.net only to pre-registered customers.

Many fake tech startups in Korea are engaging in scam activities without their own technology or products. They continue to use Deep Block, evade license payments, and even attempt malicious hacking. We will carefully consider solutions to this issue in the coming days. If you wish to use our product, please contact us at deepblock.net/contact. We apologize for inconvenience, and please feel free to contact us anytime if you have any questions.

Build Defect Detection AI for Large-Area Bright Field Microscopy

In this step-by-step guide, we’ll show you how to build a defect detection AI model using deepblock.net. Here’s what we achieved: ✅ Trained a defect detection model with only 52 annotations. ✅ Detected over 1,000 defects across an entire IC in under 5 minutes. ✅ While the accuracy isn’t perfect, this prototype allowed us to: - Easily validate the model’s feasibility. - Quickly collect training datasets for fine-tuning and model optimization. As emerging markets like India expand into semiconductor manufacturing, MEMS, and nano-device fabrication, infrastructure challenges persist compared to established leaders like Taiwan, the U.S., China, Korea, and Japan. Furthermore, small fabs and research institutions around the world often cannot afford high-end inspection tools from KLA or AMAT. 🔧 That’s where Deep Block comes in: With just an affordable optical or electron microscope, you can use our Large Area Analysis AI Toolbox to: ✨ Rapidly analyze large-area photomicrograph. ✨ Automate defect detection. ✨ Transform failure analysis workflows with computer vision. Discover how Deep Block can empower your facility to stay competitive and drive innovation in advanced manufacturing.

Semiconductor Defect Detection with Bright Field Microscopy and Dark Field Microscopy

This article explores the principles and applications of Bright Field and Dark Field microscopy in semiconductor manufacturing. Bright Field microscopy excels in detecting random defects like particles, scratches, and contamination through reflected light intensity, making it ideal for routine inspections. On the other hand, Dark Field microscopy enhances defect detection by capturing scattered light, offering superior contrast for identifying systematic defects such as mask or pellicle issues and pattern misalignments in patterned wafers.