In advanced wafer metrology and surface inspection, precision is everything. Structured Illumination Microscopy (SIM) provides a robust, material-independent solution for inspecting challenging surfaces such as polished semiconductors, glasses, epitaxial layers, oxides, and metals. Unlike conventional confocal microscopy, SIM achieves high-resolution 3D topography and intensity imaging without the need for pinholes, lasers or moving parts. This unique approach enables: ✅ Nanometer-precision surface scannnig with an accuracy better than 3 nm across a wide range of materials. ✅ High-speed imaging – Capture 60 confocal frames per second for fast and reliable inspection. ✅ Efficient optical sectioning – Acquire 120 optical sections in just 2 seconds, covering a height of 20 μm. This technology is revolutionizing semiconductor manufacturing, ensuring that even the most challenging surfaces can be measured with unprecedented precision and efficiency. How do you see SIM addressing the challenges of next-generation semiconductor manufacturing? Let’s discuss in the comments! 👇 #Microscopy #Confocal #Semiconductors
